Multilevel self-aligned microcontact printing system

Langmuir

Volumn 26, Issue 20, 2010, Pages 16163-16170

  Choonee, K ^a   Syms, R R A ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC WET ETCHING; DEMOLDING; ELASTIC MEMBRANES; MEMS FABRICATION; MICRO CONTACT PRINTING; OPTICAL ALIGNMENTS; POLYDIMETHYLSILOXANE PDMS; REPLICA MOLDING; SELF ALIGNMENT; SELF-ALIGNED; WAFER SCALE;

ALIGNMENT; ELECTRON DEVICE MANUFACTURE; MECHANICAL STABILITY; MICROCHANNELS; MOLDING; PHOTOLITHOGRAPHY; PRINTING; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; STAINLESS STEEL; STEEL SHEET; WET ETCHING;

REACTIVE ION ETCHING;

EID: 77957922486     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la100960z     Document Type: Article

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