Solving the shrinkage-induced PDMS alignment registration issue in multilayer soft lithography

Journal of Micromechanics and Microengineering

Volumn 19, Issue 6, 2009, Pages

  Moraes, Christopher ^a,b   Sun, Yu ^a,b   Simmons, Craig A ^a,b  

^a UNIVERSITY OF TORONTO   (Canada)

^b UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BRAILLE DISPLAY; CALIBRATION PROCESS; MICROFABRICATED; MOLD FABRICATION; MULTILAYER SOFT LITHOGRAPHY; MULTILAYERED DEVICES; POLYDIMETHYLSILOXANE PDMS; RAPID METHOD; THREE-LAYER; WELL-ALIGNED;

MICROCHANNELS; MICROFABRICATION; MULTILAYERS; NANOIMPRINT LITHOGRAPHY; SHRINKAGE; SILICONES;

ALIGNMENT;

EID: 70349970555     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/6/065015     Document Type: Article

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