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Volumn 51, Issue 2, 2010, Pages 271-276

Oxidation resistance of CrAIN films with different microstructures prepared by pulsed DC balanced magnetron sputtering system

(5) Khamseh, S a Nose, M a Kawabata, T a Matsuda, K a Ikeno, S a

a UNIVERSITY OF TOYAMA (Japan)

Author keywords

CrAlN film; Facing target type sputtering (FTS); Oxidation resistance; Pulsed DC magnetron sputtering

Indexed keywords

CRALN FILM; HIGH HARDNESS; INTERNAL STRESS; MAGNETRON SPUTTERING SYSTEMS; MIXED STRUCTURE; PULSE WIDTH; PULSED DC; PULSED DC MAGNETRON SPUTTERING; TARGET TYPE;

CHROMIUM; HARDNESS; INTERNAL OXIDATION; MAGNETRONS; MICROSTRUCTURE; OXIDATION RESISTANCE; SPACECRAFT INSTRUMENTS;

FILM PREPARATION;

EID: 77949694828 PISSN: 13459678 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans.MC200912 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.