|
|
Volumn 49, Issue 9, 2008, Pages 2082-2090
|
|
Effect of deposition conditions on the structure and properties of CrAlN films prepared by pulsed DC reactive sputtering in FTS mode at high Al content
a
|
|
Author keywords
CrAIN; Facing target type sputtering (FTS); Nanoindentation; Pulsed magnetron sputtering; Transmission electron microscopy (TEM)
|
|
Indexed keywords
ABS RESINS;
ALUMINUM;
CHROMIUM;
ELECTRON MICROSCOPES;
FILM PREPARATION;
FLOW RATE;
HARDNESS;
MAGNETRONS;
MECHANICAL PROPERTIES;
MICROSCOPIC EXAMINATION;
MORPHOLOGY;
NANOINDENTATION;
NITROGEN;
REACTIVE SPUTTERING;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SODIUM;
SPACECRAFT INSTRUMENTS;
THEOREM PROVING;
AL ALLOYS;
COLUMNAR MORPHOLOGIES;
CRAIN;
CRAL-N FILMS;
DC REACTIVE SPUTTERING;
DEPOSITION CONDITIONS;
DUTY-CYCLE;
GRAIN SIZES;
HIGH AL CONTENTS;
HIGH HARDNESSES;
NITROGEN FLOW RATES;
PHASE FORMATIONS;
PHASE RATIOS;
PULSE FREQUENCIES;
PULSED DC MAGNETRON SPUTTERING;
PULSED DC POWERS;
PULSED MAGNETRON SPUTTERING;
SPUTTERING CONDITIONS;
STRUCTURE AND PROPERTIES;
XRD ANALYSES;
MAGNETRON SPUTTERING;
|
|
EID: 54549102233
PISSN: 13459678
EISSN: None
Source Type: Journal
DOI: 10.2320/matertrans.MRA2008604 Document Type: Article |
|
Times cited : (16)
|
|
References (33)
|
