A comparative study of magnetron co-sputtered nanocrystalline titanium aluminium and chromium aluminium nitride coatings

Scripta Materialia

Volumn 50, Issue 12, 2004, Pages 1461-1466

  Wuhrer, R ^a   Yeung, W Y ^a  

^a UNIVERSITY OF TECHNOLOGY SYDNEY   (Australia)

Author keywords

Nanocrystalline materials; Sputtering; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; ENERGY DISPERSIVE SPECTROSCOPY; HARDNESS; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

GRAIN REFINEMENT; NITROGEN PRESSURE;

NANOSTRUCTURED MATERIALS;

EID: 1842864108     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2004.03.007     Document Type: Article

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