Nanostructured CrAlN films prepared at different pulse widths by pulsed DC reactive sputtering in facing target type system

Materials Transactions

Volumn 49, Issue 11, 2008, Pages 2737-2742

  Khamseh, Sara ^a   Nose, Masateru ^a   Ueda, Shohei ^a   Kawabata, Tokimasa ^a   Nagae, Takekazu ^a   Matsuda, Kenji ^a   Ikeno, Susumu ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

CrAlN; Facing target type sputtering (FTS); Nanoindentation; Pulse width; Pulsed magnetron sputtering; Transmission electron microscopy (TEM)

Indexed keywords

CHROMIUM; ELECTRON MICROSCOPES; FACINGS; HARDNESS; MAGNETRONS; MECHANICAL PROPERTIES; NANOINDENTATION; SPACECRAFT INSTRUMENTS; STRESSES; STRUCTURAL PROPERTIES; TARGETS; TRANSMISSION ELECTRON MICROSCOPY;

CRAL-N FILMS; CRALN; DC REACTIVE SPUTTERING; FILM STRUCTURES; GRAIN SIZES; HIGH HARDNESSES; INTERNAL STRESSES; MIXED STRUCTURES; NANOSTRUCTURED; PROPERTIES AND MICROSTRUCTURES; PULSE WIDTH; PULSED MAGNETRON SPUTTERING; STRUCTURE AND PROPERTIES; TRIBOLOGICAL PROPERTIES; TYPE SYSTEMS; XRD ANALYSES; YOUNG'S MODULUS;

FILM PREPARATION;

EID: 58149231531     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.MER2008249     Document Type: Article

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