Fabrication of uniform gratings on composite semiconductors using UV nanoimprint lithography

Journal of Photopolymer Science and Technology

Volumn 22, Issue 2, 2009, Pages 213-217

  Ishizuka, Shugo ^a   Nakao, Masashi ^b,c   Mashiko, Shinro ^b,c   Mizuno, Jun ^a   Shoji, Shuichi ^a  

^a WASEDA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Composite semiconductors; Gratings; Uniformity; UV nanoimprint lithography

Indexed keywords

EID: 70350160114     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.213     Document Type: Article

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