Advanced ultraviolet cross-link process and materials for global planarization

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 7, Issue 4, 2008, Pages

  Takei, Satoshi ^a   Horiguchi, Yusuke ^a   Ohashi, Tomoya ^a   Mano, Yuichi ^a   Muramatsu, Makoto ^b   Iwashita, Mitsuaki ^b   Tsuchiya, Katsuhiro ^b   Samura, Akira ^b  

^a NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

Clean track; Double patterning process; Imprint; Lithography; Planarization; Ultraviolet cross link materials; XUV ; coater

Indexed keywords

CHEMICAL MECHANICAL POLISHING; LITHOGRAPHY; NANOTECHNOLOGY;

CLEAN TRACK; DOUBLE PATTERNING PROCESS; IMPRINT; PLANARIZATION; ULTRAVIOLET CROSS-LINK MATERIALS;

CHEMICAL POLISHING;

EID: 53349161254     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2990739     Document Type: Article

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