Process control for 32 nm imprint masks using variable shape beam pattern generators

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 709-713

  Thompson, Ecron ^a   Selinidis, Kosta ^a   Maltabes, John G ^a   Resnick, Douglas J ^a   Sreenivasan, S V ^a  

^a MOLECULAR IMPRINTS INC   (United States)

Author keywords

Imprint lithography; Imprint mask; S FIL; Template; Variable shaped beam (VSB)

Indexed keywords

IMPRINT LITHOGRAPHY; IMPRINT MASK; S-FIL; TEMPLATE; VARIABLE SHAPED BEAM (VSB);

DIRECTIONAL PATTERNS (ANTENNA); ELECTRON BEAM LITHOGRAPHY; PHOTORESISTORS; PHOTORESISTS; REPORT GENERATORS;

NANOIMPRINT LITHOGRAPHY;

EID: 67349186944     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.071     Document Type: Article

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