Complex phase compositions in nanostructured coatings as evidenced by photoelectron spectroscopy: The case of Al-Si-N hard coatings

Journal of Applied Physics

Volumn 108, Issue 2, 2010, Pages

  Ṕlisson Schecker, Aude ^a   Hug, Hans Josef ^a,b   Patscheider, Jörg ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ALN; BULK SILICON-NITRIDE; CHEMICAL BONDINGS; CHEMICAL ENVIRONMENT; CHEMICAL STATE; COMPOSITIONAL REGION; CORE LEVELS; ENERGY DIFFERENCES; INTERGRANULAR PHASE; LINE POSITIONS; NANOSTRUCTURED COATINGS; SI CONTENT; SILICON CONCENTRATION; SILICON CONTENTS; SOLUBILITY LIMITS; STRUCTURAL CHANGE; XPS DATA; XRD;

ALUMINUM; BINDING ENERGY; BIOLOGY; CHEMICAL BONDS; ELECTRONS; HARD COATINGS; MONOLAYERS; PHOTOELECTRICITY; PHOTONS; SILICON; SILICON NITRIDE; SOLUBILITY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77955825805     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3460099     Document Type: Article

References (35)

1. J. Musil, Surf. Coat. Technol. SCTEEJ 0257-8972 125, 322 (2000). 10.1016/S0257-8972(99)00586-1
2. J. Patscheider, MRS Bull. MRSBEA 0883-7694 28, 180 (2003).
3. S. Vepek, M. G. J. Vepek-Heijman, P. Karvánková, and J. Procházka, Thin Solid Films THSFAP 0040-6090 476, 1 (2005). 10.1016/j.tsf.2004.10.053
4. P. H. Mayrhofer, C. Mitterer, L. Hultman, and H. Clemens, Prog. Mater. Sci. PRMSAQ 0079-6425 51, 1032 (2006). 10.1016/j.pmatsci.2006.02.002
5. E. A. Levashov and D. V. Shtansky, Russ. Chem. Rev. RCRVAB 0036-021X 76, 463 (2007). 10.1070/RC2007v076n05ABEH003679
6. M. Birkholz, Thin Film Analysis by X-Ray Scattering (Wiley-VCH, Weinham, 2006).
7. S. Vepek, M. G. J. Vepek-Heijman, and R. Zhang, J. Phys. Chem. Solids JPCSAW 0022-3697 68, 1161 (2007). 10.1016/j.jpcs.2007.01.013
8. I. Bertóti, Surf. Coat. Technol. SCTEEJ 0257-8972 151-152, 194 (2002). 10.1016/S0257-8972(01)01619-X
9. P. J. Martin, A. Bendavid, J. M. Cairney, and M. Hoffman, Surf. Coat. Technol. SCTEEJ 0257-8972 200, 2228 (2005). 10.1016/j.surfcoat.2004.06.012
10. F. Kauffmann, G. Dehm, V. Schier, A. Schattke, T. Beck, S. Lang, and E. Arzt, Thin Solid Films THSFAP 0040-6090 473, 114 (2005). 10.1016/j.tsf.2004.08. 080
11. A. Ṕlisson, M. Parlinska-Wojtan, H. J. Hug, and J. Patscheider, Surf. Coat. Technol. SCTEEJ 0257-8972 202, 884 (2007). 10.1016/j.surfcoat.2007. 05.094
12. A. Ṕlisson, Ph.D. thesis, University of Basel, 2009.
13. A. Ṕlisson-Schecker, H. J. Hug, and J. Patscheider, " Charge referencing issues in the XPS analysis of insulators, as evidenced in the case of Al-Si-N thin films.," Surf. Interface Anal. SIANDQ 0142-2421 (submitted).
14. ASTM Guide E 1523-03, Standard Guide to Charge Control and Charge Referencing Techniques in X-ray Photoelectron Spectroscopy (ASTM International, 2003).
15. S. Kohiki and K. Oki, J. Electron Spectrosc. Relat. Phenom. JESRAW 0368-2048 36, 105 (1985). 10.1016/0368-2048(85)80011-6
16. S. B. DiCenzo, S. D. Berry, and E. H. Hartford, Jr., Phys. Rev. B PLRBAQ 0556-2805 38, 8465 (1988). 10.1103/PhysRevB.38.8465
17. H. -G. Boyen, A. Ethirajan, G. Kästle, F. Weigl, P. Ziemann, G. Schmid, M. G. Garnier, M. Büttner, and P. Oelhafen, Phys. Rev. Lett. PRLTAO 0031-9007 94, 016804 (2005). 10.1103/PhysRevLett.94.016804
18. NIST X-ray Photoelectron Spectroscopy Database, Version 3.5 (National Institute of Standards and Technology, Gaithersburg, 2003); http://srdata.nist. gov/xps/.
19. R. Perrem, F. Henry, G. Peraudeau, B. Armas, R. Berjoan, and E. B̂che, J. Mater. Sci. JMTSAS 0022-2461 32, 1305 (1997). 10.1023/A:1018556606993
20. G. Soto, W. de la Cruz, and M. H. Farías, J. Electron Spectrosc. Relat. Phenom. JESRAW 0368-2048 135, 27 (2004). 10.1016/j.elspec.2003.12.004
21. M. Witthaut, R. Cremer, and D. Neuschütz, Surf. Interface Anal. SIANDQ 0142-2421 30, 580 (2000). 10.1002/1096-9918(200008)30:1<580::AID- SIA847>3.0.CO;2-3
22. H. K. Sanghera and J. L. Sullivan, Surf. Interface Anal. SIANDQ 0142-2421 27, 678 (1999). 10.1002/(SICI)1096-9918(199907)27:7<678::AID-SIA562>3.0. CO;2-V
23. G. M. Ingo and N. Zacchetti, High. Temp. Sci. HITSAC 0018-1536 28, 137 (1998).
24. Y. Maeno, M. Kobayashi, K. Oishi, and K. Kawamura, IEEE TJMJ 5, 59 (1990).
25. D. Briggs, in Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy, edited by, D. Briggs, and, J. T. Grant, (IM Publications and Surface Spectra, UK, 2003), pp. 44-45.
26. C. Pignedoli, D. Passerone, H. J. Hug, A. Ṕlisson-Schecker, and J. Patscheider, Appl. Phys. Lett. APPLAB 0003-6951 96, 071908 (2010). 10.1063/1.3323093
27. R. Cole, N. J. Brooks, and P. Weightman, Phys. Rev. Lett. PRLTAO 0031-9007 78, 3777 (1997). 10.1103/PhysRevLett.78.3777
28. L. Köver, in Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy, edited by, D. Briggs, and, J. T. Grant, (IM Publications and Surface Spectra, UK, 2003), p. 442.
29. R. Franz, J. Neidhardt, B. Sartory, R. Tessadri, and C. Mitterer, Thin Solid Films THSFAP 0040-6090 516, 6151 (2008). 10.1016/j.tsf.2007.11.024
30. S. Vepek and S. Reiprich, Thin Solid Films THSFAP 0040-6090 268, 64 (1995). 10.1016/0040-6090(95)06695-0
31. F. Vaz, L. Rebouta, P. Goudeau, J. Pacaud, H. Garem, J. P. Rivìre, A. Cavaleiro, and E. Alves, Surf. Coat. Technol. SCTEEJ 0257-8972 133-134, 307 (2000). 10.1016/S0257-8972(00)00947-6
32. E. Ribeiro, L. Rebouta, S. Carvalho, F. Vaz, G. G. Fuentes, R. Rodriguez, M. Zazpe, E. Alves, P. Goudeau, and J. P. Rivìre, Surf. Coat. Technol. SCTEEJ 0257-8972 188-189, 351 (2004). 10.1016/j.surfcoat.2004.08.020
33. R. Sanjińs, M. Benkahoul, C. S. Sandu, P. E. Schmid, and F. Ĺvy, J. Appl. Phys. JAPIAU 0021-8979 98, 123511 (2005). 10.1063/1.2149488
34. C. S. Sandu, F. Medjani, R. Sanjińs, A. Karimi, and F. Ĺvy, Surf. Coat. Technol. SCTEEJ 0257-8972 201, 4219 (2006). 10.1016/j.surfcoat. 2006.08.002
35. J. L. Endrino, S. Palacín, A. Gutírrez, F. Schäffers, and J. E. Krzanowski, J. Mater. Sci. JMTSAS 0022-2461 42, 7607 (2007). 10.1007/s10853-007-1870-9