![]() |
Volumn 32, Issue 5, 1997, Pages 1305-1312
|
An XPS and thermogravimetric study of oxidized AlN and AlN-Si3N4 layers deposited by liquid-phase chemical vapour deposition
a
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ABRASIVES;
BONDING;
CHEMICAL VAPOR DEPOSITION;
ETCHING;
ION BOMBARDMENT;
OXIDATION;
OXIDATION RESISTANCE;
PHOTOEMISSION;
POLISHING;
SURFACE CLEANING;
THERMOGRAVIMETRIC ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ALUMINUM NITRIDE;
ALUMINUM NITRIDE SILICON NITRIDE;
LIQUID PHASE CHEMICAL VAPOR DEPOSITION;
ULTRAHIGH VACUUM;
WEIGHT GAIN;
NITRIDES;
|
EID: 0031103653
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1018556606993 Document Type: Article |
Times cited : (21)
|
References (38)
|