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Volumn 32, Issue 5, 1997, Pages 1305-1312

An XPS and thermogravimetric study of oxidized AlN and AlN-Si3N4 layers deposited by liquid-phase chemical vapour deposition

(6) Perrem, R a Henry, F a Peraudeau, G a Armas, B a Berjoan, R a Beche E b

a Centre National de la Recherche Scientifique (France)

b LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; BONDING; CHEMICAL VAPOR DEPOSITION; ETCHING; ION BOMBARDMENT; OXIDATION; OXIDATION RESISTANCE; PHOTOEMISSION; POLISHING; SURFACE CLEANING; THERMOGRAVIMETRIC ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDE; ALUMINUM NITRIDE SILICON NITRIDE; LIQUID PHASE CHEMICAL VAPOR DEPOSITION; ULTRAHIGH VACUUM; WEIGHT GAIN;

NITRIDES;

EID: 0031103653 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1023/A:1018556606993 Document Type: Article

Times cited : (21)

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