Transmission electron microscopy and x-ray diffraction investigation of the microstructure of nanoscale multilayer TiAlN/VN grown by unbalanced magnetron deposition

Journal of Materials Research

Volumn 19, Issue 4, 2004, Pages 1093-1104

  Luo, Q ^a   Lewis, D B ^a   Hovsepian, P Eh ^a   Munz W D ^a  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; TEXTURES; THICKNESS MEASUREMENT; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

TITANIUM ALUMINUM NITRIDE; VANADIUM NITRIDE;

MULTILAYERS;

EID: 2442503487     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0143     Document Type: Article

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