|
Volumn 518, Issue 18, 2010, Pages 5349-5354
|
Influence of microstructure and hydrogen concentration on amorphous silicon crystallization
|
Author keywords
Hydrogenated amorphous silicon; Polycrystalline silicon; Solid phase crystallization
|
Indexed keywords
AMORPHOUS MATRICES;
CRYSTALLINE SILICONS;
GLASS SUBSTRATES;
HIGH FREQUENCY PLASMA;
HYDROGEN CONCENTRATION;
HYDROGENATED AMORPHOUS SILICON;
NANO-CRYSTALLINE SILICON THIN FILMS;
NUCLEATION AND GROWTH;
POLY-CRYSTALLINE SILICON;
SOLID PHASE CRYSTALLIZATION;
SUBSTRATE TEMPERATURE;
THERMAL-ANNEALING;
AMORPHOUS FILMS;
CRYSTALLIZATION;
HYDROGEN;
HYDROGENATION;
NANOCRYSTALLINE SILICON;
PLASMA DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
SEMICONDUCTING SILICON COMPOUNDS;
SUBSTRATES;
X RAY DIFFRACTION;
AMORPHOUS SILICON;
|
EID: 77955656926
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.04.029 Document Type: Article |
Times cited : (51)
|
References (36)
|