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Volumn 62, Issue 1, 2000, Pages 201-205
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Preparation of thin film polycrystalline silicon on glass by photo-thermal annealing
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
AMORPHOUS SILICON;
ANNEALING;
CRYSTALLIZATION;
FILM PREPARATION;
GLASS;
PHOTONS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING SILICON;
THIN FILMS;
PHOTO-THERMAL ANNEALING (PTA);
SOLID-PHASE CRYSTALLIZATION (SPC);
SEMICONDUCTING FILMS;
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EID: 0033898199
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0927-0248(99)00159-2 Document Type: Article |
Times cited : (11)
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References (10)
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