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Volumn 62, Issue 1, 2000, Pages 201-205

Preparation of thin film polycrystalline silicon on glass by photo-thermal annealing

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; FILM PREPARATION; GLASS; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; THIN FILMS;

EID: 0033898199     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(99)00159-2     Document Type: Article
Times cited : (11)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.