Large-grain polycrystalline silicon thin films obtained by low-temperature stepwise annealing of hydrogenated amorphous silicon

Thin Solid Films

Volumn 310, Issue 1-2, 1997, Pages 67-74

  Ruther R ^a,c   Livingstone, J ^a   Dytlewski, N ^b  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^c FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

Amorphous; Large grain polycrystalline silicon; Thin films

Indexed keywords

ANNEALING; ARGON; CRYSTALLIZATION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN SIZE AND SHAPE; HYDROGEN; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THIN FILMS;

ELASTIC RECOIL DETECTION ANALYSIS (ERDA); THERMAL BUDGET;

AMORPHOUS FILMS;

EID: 0031271731     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00362-3     Document Type: Article

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