Large-grained oriented polycrystalline silicon thin films prepared by nickel-silicide-induced crystallization

Journal of Crystal Growth

Volumn 311, Issue 1, 2008, Pages 54-58

  Schmidt, J A ^a   Budini, N ^a   Rinaldi, P ^a   Arce, R D ^a   Buitrago, R H ^a  

^a UNIVERSIDAD NACIONAL DEL LITORAL   (Argentina)

Author keywords

A1. Optical microscopy; A1. Recrystallization; A1. X ray diffraction; A2. Seed crystals; B2. Semiconducting silicon; B3. Solar cells

Indexed keywords

AMORPHOUS MATERIALS; AMORPHOUS SILICON; BORON; CRYSTALLIZATION; CRYSTALS; DIFFRACTION; DOPING (ADDITIVES); FILM GROWTH; NANOCRYSTALLINE ALLOYS; NICKEL; NICKEL ALLOYS; NICKEL COMPOUNDS; NONMETALS; OPTICAL DATA STORAGE; OPTICAL INSTRUMENTS; OPTICAL MICROSCOPY; PHOSPHORUS; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; POLYSILICON; RECRYSTALLIZATION (METALLURGY); SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICIDES; SOLAR CELLS; SOLAR EQUIPMENT; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

A1. OPTICAL MICROSCOPY; A1. RECRYSTALLIZATION; A1. X-RAY DIFFRACTION; A2. SEED CRYSTALS; B2. SEMICONDUCTING SILICON; B3. SOLAR CELLS;

AMORPHOUS FILMS;

EID: 57649217599     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.10.027     Document Type: Article

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