UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer

Microelectronic Engineering

Volumn 87, Issue 11, 2010, Pages 2411-2415

  Ye, Dexian ^a   Wang, Pei I ^a   Ye, Zhuqiu ^b   Ou, Ya ^a   Ghoshal, Rajat ^c   Ghoshal, Ramkrishna ^c   Lu, Toh Ming ^a  

^a Rensselaer Polytechnic Institute   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^c Polyset Company   (United States)

Author keywords

Epoxy siloxane polymers; Nanoimprint resist; UV curable polymers; UV nanoimprint lithography

Indexed keywords

ATOMIC FORCE MICROSCOPES; EPOXY SILOXANE; HARD MOLDS; HYDROGEN SILSESQUIOXANE; NANO-IMPRINT; PDMS SOFT MOLD; POLYDIMETHYLSILOXANE PDMS; SCANNING ELECTRON MICROSCOPE; SOFT MOLD; SUB-100 NM; ULTRA-VIOLET; UV CURABLE POLYMER; UV NANOIMPRINT LITHOGRAPHY; UV-CURABLE EPOXIES;

MICROCHANNELS; MICROSCOPES; MOLDS; NANOSTRUCTURES; POLYMERS; SCANNING ELECTRON MICROSCOPY; TOLUENE;

NANOIMPRINT LITHOGRAPHY;

EID: 77955512284     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.04.016     Document Type: Article

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