Novel photocurable epoxy siloxane polymers for photolithography and imprint lithography applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages 244-248

  Wang, Pei I ^a   Nalamasu, O ^a   Ghoshal, Rajat ^b   Ghoshal, Ram ^b   Schaper, Charles D ^c   Li, Andrew ^d   Lu, Toh Ming ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b Polyset Company   (United States)

^c Transfer Devices Inc   (United States)

^d APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPOXY SILOXANE POLYMERS; IMPRINT LITHOGRAPHY; REDISTRIBUTION LAYER;

CATIONIC POLYMERIZATION; DIELECTRIC PROPERTIES; EPOXY RESINS; INTEGRATED CIRCUITS; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

POLYMERS;

EID: 38849193536     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2834559     Document Type: Article

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