Fabrication of polymeric substrates with well-defined nanometer-scale topography and tailored surface chemistry

Advanced Materials

Volumn 14, Issue 20, 2002, Pages 1468-1472

  Kim, S R ^a   Teixeira, A I ^a,b   Nealey, P F ^a,b   Wendt, A E ^a,c   Abbott, N L ^a  

^a University of Wisconsin Madison   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c Center for Plasma Aided Manufacturing   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; EPOXY RESINS; LIQUID CRYSTALS; NANOSTRUCTURED MATERIALS; ORGANIC POLYMERS; PHYSICAL VAPOR DEPOSITION; PLASTICS MOLDING; SELF ASSEMBLY; SILICON; SUBSTRATES; SURFACE TOPOGRAPHY;

ALKANETHIOLS; NANOMETER SCALE TOPOGRAPHY; OPTICAL TRANSPARENCY;

NANOTECHNOLOGY;

EID: 0037121046     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(20021016)14:20<1468::AID-ADMA1468>3.0.CO;2-H     Document Type: Article

References (40)

1. a) R. G. Flemming, C. J. Murphy, G. A. Abrams, S. L. Goodman, P. F. Nealey, Biomaterials 1999, 20, 573.
2. b) X. F. Walboomers, H. J. E. Croes, L. A. Ginsel, J. A. Jansen, J. Biomed. Mater. Res. 1999, 47, 204.
3. c) A. F. von Recum, C. E. Shannon, E. C. Cannon, K. J. Long, T. G. van Kooten, J. Meyle, Tissue Eng. 1996, 2, 241.
4. d) A. S. G. Curtis, C. Wilkinson, Biomaterials 1997, 18, 1573.
5. e) D. M. Brunette, Effect of Surface Topography on Cell Behavior In Vitro in Nanofabrication and Biosystems (Eds: H. C. Hoch), Cambridge University Press, New York 1996.
6. a) V. K. Gupta, J. J. Skaife, T. B. Dubrovsky, N. L. Abbott, Science 1998, 279, 2077.
7. b) J. J. Skaife, N. L. Abbott, Langmuir 2000, 16, 3529.
8. c) J. J. Skaife, J. M. Brake, N. L. Abbott, Langmuir 2001, 17, 5448.
9. d) J. J. Skaife, N. L. Abbott, Langmuir 2001, 17, 5595.
10. e) S.-R. Kim, R. R. Shah, N.L. Abbott, Anal. Chem. 2000, 72, 4646.
11. f) S.-R. Kim, N. L. Abbott, Adv. Mater. 2001, 13, 1445.
12. a) J. Fujita, H. Watanabe, Y. Ochiai, S. Manako, J. S. Tsai, S. Matsui, Appl. Phys. Lett. 1995, 66, 3065.
13. b) M. W. Moreau, Semiconductor Lithography: Principles and Materials, Plenum Press, New York 1988.
14. E. S. Lee, P. Vetter, T. Miyashita, T. Uchida, M. Kano, M. Abe, K. Sugawara, Jpn. J. Appl. Phys. 1993, 32, L1436.
15. a) Y. Xia, G. M. Whitesides, Annu. Rev. Mater. Sci. 1998, 28, 153,
16. b) Y. Xia, G. M. Whitesides, Angew. Chem. Int. Ed. 1998, 37, 550.
17. c) Y. Xia, J. A. Rogers, K. E. Paul, G. M. Whitesides, Chem. Rev. 1999, 99, 1823.
18. H. J. Dai, J. H. Hafner, A. G. Rinzler, D. T. Colbert, R. E. Smalley, Nature 1996, 384, 147.
19. Our studies (not published) using PU replicas have verified that images obtained from contact-mode and tapping-mode AFM revealed the same groove shape, depth, and width.
20. The hardnesses of the cured polymers are reported to be similar (83-90 of Shore D hardness units [9]). The differences in topography appear unlikely to result from differences in hardness when measured by contact-mode AFM. In contrast, the image of the PDMS (Shore A hardness of =≈ 50 [9]) may be influenced by deformation under the tip of the AFM (Fig. 1B). Also shrinkage during curing appears unlikely to explain differences in topography measured by AFM (PU: ≈ 1.5%, PC: ≈ 0.3%, PS: ≈ 4%).
21. Shore hardness (most common method for testing hardness of plastics) measures the resistance of a plastic toward indentation. A scale from 0 to 100 provides an empirical index. The "A" scale is ideal for testing soft materials. The "D" scale is for use on harder materials that exceed a reading of 90 on the "A" scale.
22. a) R. Drawhorn, N. L. Abbott, J. Phys. Chem. 1995, 99, 16511.
23. 9SH mixture (2:8) for 2 h.
24. Two possible mechanisms have been considered. The first one is based on anisotropic intermolecular interactions between liquid crystals and oriented monolayers of molecules (or oriented molecular chains of polymer films) on a substrate [12]. The second mechanism is based on distortion of the director field around the topography of the surface (such as grooved topographies) so as to minimize the elastic energy arising from distortion of the director [3].
25. a) B. Jérôme, Rep. Prog. Phys. 1991, 54, 391.
26. b) J. A. Castellano, Mol. Cryst. Liq. Cryst. 1983, 94, 33.
27. c) H. Aoyama, Y. Yamazaki, N. Matsuura, H. Mada, S. Kobayashi, Mol. Cryst. Liq. Cryst. 1981, 72, 127.
28. d) J. M. Geary, J. W. Goodby, A. R. Kmetz, J. S. Patal, J. Appl. Phys. 1987, 62, 4100.
29. e) K. Nakajima, H. Wakemoto, S. Sato, F. Yokotami, S. Ishihara, Y. Matsuo, Mol. Cryst. Liq. Cryst. B 1990, 180, 223.
30. f) Y. M. Zhu, Z. H. Lu, F. Qian, X. M. Yang, Y. Wei, Appl. Phys. Lett. 1993, 63, 3432.
31. g) A. J. Pidduck, G. P. Bryan-Brown, S. D. Haslam, R. Bannister, I. Kitely, T. J. McMaster, L. Boogaard, J. Vac. Sci. Technol. A 1996, 14, 1723.
32. a) D. W. Berreman, Phys. Rev. Lett. 1972, 28, 1683.
33. b) D. W. Berreman, Mol. Cryst. Liq. Cryst. 1973, 23, 215.
34. c) U. Wolff, W. Greubel, H. Krueger, Mol. Cryst. Liq. Cryst. 1973, 23, 187.
35. d) L. T. Creagh, H. Kruger, Mol. Cryst. Liq. Cryst. 1973, 24, 59.
36. e) M. Nakamura, J. Appl. Phys. 1981, 52, 4561.
37. 11SH induce a planar anchoring of 5CB on planar gold substrates. a) W. J. Miller, N. L. Abbott, J. D. Paul, M. Prentiss, Appl. Phys. Lett. 1996, 69, 1852.
38. b) R. R. Shah, N. L. Abbott, J. Phys. Chem. B 2001, 105, 4936.
39. K. L. Prime, G. M. Whitesides, J. Am. Chem. Soc. 1993, 115, 10714.
40. Y.-Y. Luk, M. Kato, M. Mrksich, Langmuir 2000, 16, 9604.