Characterization of antisticking layers for UV nanoimprint lithography molds with scanning probe microscopy

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Kurihara, Masaaki ^a,b   Hatakeyama, Sho ^a   Yamada, Noriko ^a   Shimomura, Takeya ^a   Nagai, Takaharu ^a   Yoshida, Kouji ^a   Tomita, Tatsuya ^a   Hoga, Morihisa ^a   Hayashi, Naoya ^a   Ohtani, Hiroyuki ^b   Fujihira, Masamichi ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESIVE FORCE; AFM; ANTISTICKING LAYERS; CRITICAL DIMENSION; DIFFERENT PROCESS; FRICTION FORCE MICROSCOPY; LIFT-OFF METHODS; MACROSCOPIC ANALYSIS; SEPARATION FORCE; SPIN-COATING PROCESS; UV NANOIMPRINT LITHOGRAPHY; VAPOR PHASE; WORK OF ADHESION;

ADHESION; ATOMIC FORCE MICROSCOPY; COATINGS; CONTACT ANGLE; MOLDS; PROBES; SCANNING ELECTRON MICROSCOPY; SPIN DYNAMICS; VAPORS;

NANOIMPRINT LITHOGRAPHY;

EID: 77955338301     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GL02     Document Type: Article

References (15)

1. J. Haisma, M. Verheijen, K. van den Heuvel, and J. van den Berg: J. Vac. Sci. Technol. B 14 (1996) 4124.
2. T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson: J. Vac. Sci. Tecnol. B 18 (2000) 3572.
3. Y. Hirai, S. Yoshida, A. Okamoto, Y. Tanaka, M. Endo, S. Irie, H. Nakagawa, and M. Sasago: J. Photopolym. Sci. Technol. 14 (2001) 457.
4. J. Taniguchi, T. Kawasaki, Y. Tokano, Y. Kogo, I. Miyamoto, M. Komuro, H. Hiroshima, N. Sakai, and K. Tada: Jpn. J. Appl. Phys. 41 (2002) 4194.
5. F. A. Houle, E. Guyer, D. C. Miller, and R. Dauskardt: J. Vac. Sci. Technol. B 25 (2007) 1179.
6. G. Y. Jung, Z. Li, W. Wu, Y. Chen, D. L. Olynick, S. Y. Wang, W. M. Tong, and R. S. Williams: Langmuir 21 (2005) 1158.
7. J. Tallal, M. Gorden, K. Berton, A. L. Charley, and D. Peyrade: Microelectron. Eng. 83 (2006) 851.
8. N. S. Cameron, A. Ott, H. Roberge, and T. Veres: Soft Matter 2 (2006) 553.
9. F. Sato, H. Okui, U. Akiba, K. Suga, and M. Fujihira: Ultramicrosopy 97 (2003) 303.
10. S. Yoda, S. P. Han, H. Kudo, K. J. Kwak, and M. Fujihira: Jpn. J. Appl. Phys. 43 (2004) 6297.
11. D. K. Owens and R. C. Wendt: J. Appl. Polym. Sci. 13 (1969) 1741.
12. F. M. Fowkes: Ind. Eng. Chem. 56 (1964) No.12, 40.
13. M. Kurihara: J. Photopolym. Sci. Technol. 20 (2007) 563.
14. F. A. Houle, C. T. Rettner, C. T. Miller, and R. Sooriysakumaran: Appl. Phys. Lett. 90 (2007) 213103.
15. M. Fujihira and Y. Morita: J. Vac. Sci. Technol. B 12 (1994) 1609.