Chemical force microscopy for hot-embossing lithography release layer characterization

Soft Matter

Volumn 2, Issue 7, 2006, Pages 553-557

  Cameron, Neil S ^a   Ott, Arnaud ^a   Roberge, Hélène ^a   Veres, Teodor ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33745290435     PISSN: 1744683X     EISSN: 17446848     Source Type: Journal    
DOI: 10.1039/b600936k     Document Type: Article

References (45)

1. B. D. Gates Q. Xu M. Stewart D. Ryan C. G. Willson G. M. Whitesides Chem. Rev. 2005 105 1171 1196
2. S. Y. Chou P. R. Krauss P. J. Renstrom Appl. Phys. Lett. 1995 67 3114
3. http://public.itrs.net
4. H.-C. Scheer H. Schultz Microelectron. Eng. 2001 56 311 332
5. H. Luesebrink T. Glinsner S. C. Jakeway H. J. Crabtree N. S. Cameron H. Roberge T. Veres J. Nanosci. Nanotechnol. 2005 5 864 868
6. M. Esch S. Kapur G. Irizarry V. Genova Lab Chip 2003 3 121 127
7. G. Luengo F.-J. Schmitt R. Hill J. Israelachvili Macromolecules 1997 30 2482 2494
8. G. Binnig C. F. Quate C. Gerber Phys. Rev. Lett. 1986 56 930 933
9. N. A. Burnham R. J. Colton J. Vac. Sci. Technol., A 1989 7 2906
10. B. Gotsmann U. Dürig Langmuir 2004 20 1495 1500
11. Springer Handbook of Nanotechnology, ed., B. Bhushan, Springer-Verlag, New York, 2004
12. http://www.zeonchemicals.com/
13. N. S. Cameron H. Roberge T. Veres S. C. Jakeway H. J. Crabtree Lab Chip 2006 10.1039/b600584e
14. Bhushan describes in detail how the pull-off occurs when the spring constant exceeds rather than equals the force of adhesion
15. J. Taniguchi T. Kawasaki Y. Tokano Y. Kogo L. Miyamoto M. Komuro H. Hiroshima N. Sakai K. Tada Jpn. J. Appl. Phys. 2002 41 4194 4197
16. J. M. Baney C.-Y. Hui J. Appl. Phys. 1999 86 4232 4241
17. J. M. Baney C.-Y. Hui Langmuir 2001 17 681 687
18. C.-Y. Hui Y. Y. Lin J. M. Baney J. Polym. Sci., Part B: Polym. Phys. 2000 38 1485 1495
19. While it is tempting to refer to this experiment as 'load-controlled', since the cantilever and piezo are coupled in this force range, compliance-control has been suggested as a more appropriate term
20. S. P. Jarvis A. Oral T. P. Weihs J. B. Pethica Rev. Sci. Instrum. 1993 64 3515
21. M. A. Lantz H. J. Hug R. Hoffman P. J. A. van Schendel P. Kappenberger S. Martin A. Baratoff H.-J. Güntherodt Science 2001 291 2580
22. J. E. Sader S. P. Jarvis App. Phys. Lett. 2004 84 1801 1803
23. C. D. Lorentz M. E. Chandross G. S. Grest M. J. Stevens E. B. Webb III Langmuir 2005 21 11744
24. M. M. Alkaisi R. J. Blaikie S. J. McNab Microelectr. Eng. 2001 57 367 373
25. K. Gyu Man K. Beomjoon M. Liebau J. Huskens D. N. Reinhoudt J. Brugger Journal of Microelectromechanical Systems 2002 11 175 181
26. Y. Hirai S. Yoshida A. Okamoto Y. Tanaka M. Endo S. Irie H. Nakagawa M. Sasago Journal of Photopolymer Science and Technology 2001 14 457 462
27. B. J. Kim Microelectron. Eng. 2001 57-58 755 760
28. B. E. Smart, in Chemistry of Organic Fluorine Compoiunds II: A Critical Review, ed., M. Hudlicky and A. E. Pavlath,, 1995, vol. 187, pp. 979-1010
29. L. Reven S. Pawsey Langmuir 2006 22 1055 1062
30. S. R. Wasserman G. M. Whitesides I. M. Tidswell B. M. Ocko P. S. Pershan J. D. Axe J. Am. Chem. Soc. 1989 111 5852 5861
31. H. Schift S. Saxer S.-G. Park C. Padeste U. Pieles J. Gobrecht Nanotechnology 2005 16 S171 S175
32. J. Genzer K. Efimenko D. A. Fischer Langmuir 2002 18 9307 9311
33. C. A. Alves M. D. Porter Langmuir 1993 9 3507 3512
34. G. Knochenhauer J. Reiche L. Brehmer T. Barberka M. Woolley R. Tredgold P. Hodge J. Chem. Soc., Chem. Commun. 1995 16 1619 1620
35. M. Sprik U. Röthlisberger M. L. Klein J. Phys. Chem. B 1997 101 2745 2749
36. M. E. Schmidt S. Shin S. A. Rice J. Phys. Chem. 1996 104 2101 2114
37. M. E. Schmidt S. Shin S. A. Rice J. Chem. Phys. 1996 104 2114 2123
38. T. Albrecht H. Elben R. Jaeger M. Kimmig R. Steiner G. Strobt B. Stühn H. Schwickert C. Ritter J. Chem. Phys. 1991 95 2807 2816
39. A. Y. Fadeev T. J. McCarthy Langmuir 2000 16 7268 7274
40. A. Ulman, An Introduction to Ultrathin Organic Films: From Langmuir-Blodgett to Self-Assembly, Academic Press, New York, 1997
41. MultiMode SPM ver 4.31ce Instrument Manual: Digital Instruments Metrology Group (Veeco), Chapter 11, 1999
42. C. D. Frisbie L. F. Rozsnyai A. Noy M. S. Wrighton C. M. Lieber Science 1994 265 2071 2074
43. It should be noted that the absolute adhesion force values are subject to some interpretation due to the nominal spring constant of the cantilevers and the effect of temperature on the scanner head, however all efforts were made to ensure that the results are self-consistent as all tips were taken from the same wafer and the experimental conditions were held constant between samples. Measurements were repeatable within 5%. We did not observe significant variability in the radii of curvature among the tips we employed
44. M. K. Corbierre N. S. Cameron M. Sutton K. Laaziri R. B. Lennox Langmuir 2005 21 6063 6072
45. M. K. Corbierre N. S. Cameron R. B. Lennox Langmuir 2004 20 2867 2873