Deoxyribonucleic acid interaction with silanized surfaces

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 9 A, 2004, Pages 6297-6302

  Yoda, Sawako ^a   Han, Seung Pil ^a   Kudo, Hidetoshi ^a   Kwak, Kwang Joo ^a   Fujihira, Masamichi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic force microscope; DNA; Fluorescence microscope; Two component silanized surfaces

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMISORPTION; CONCENTRATION (PROCESS); DERIVATIVES; ELECTROPHORESIS; ELECTROSTATICS; SILANES; TOLUENE;

ALKYLSILANE; FLUORESCENCE MICROSCOPE; GLASS SURFACE; TWO COMPONENT SILANIZED SURFACES;

DNA;

EID: 9244220147     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6297     Document Type: Article

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