Nanoscale patterning by UV nanoimprint lithography using an organometallic resist

ACS Applied Materials and Interfaces

Volumn 1, Issue 11, 2009, Pages 2645-2650

  Acikgoz, Canet ^a   Vratzov, Boris ^b   Hempenius, Mark A ^a   Vancso, G Julius ^a   Huskens, Jurriaan ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b NT and D Nanotechnology and Devices   (Germany)

Author keywords

pattern transfer; poly(ferrocenylsilane)s; polymer resist; reactive ion etching; UV (light assisted) nanoimprint lithography

Indexed keywords

FERROCENYLSILANE; PATTERN TRANSFERS; POLYMER RESIST; REACTIVE ION; UV (LIGHT-ASSISTED) NANOIMPRINT LITHOGRAPHY;

IONS; NANOIMPRINT LITHOGRAPHY; ORGANOMETALLICS; OXYGEN;

REACTIVE ION ETCHING;

EID: 77954701371     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am9005379     Document Type: Article

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