Fabrication of capacity-equalized mold for homogenizing residual layer thickness in imprint lithography

Japanese Journal of Applied Physics

Volumn 47, Issue 10 PART 1, 2008, Pages 8098-8100

  Hiroshima, Hiroshi ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Capacity equalized mold; Imprint lithography; Nanoimprint; Pattern density; Residual layer

Indexed keywords

FABRICATION; MOLDS; SPIN DYNAMICS;

CAPACITY-EQUALIZED MOLD; IMPRINT LITHOGRAPHY; NANOIMPRINT; PATTERN DENSITY; RESIDUAL LAYER;

NANOIMPRINT LITHOGRAPHY;

EID: 62249169918     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.8098     Document Type: Article

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