Ultrasonic nanoimprinting in organic spin-on-glass-coated Si substrates

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Mekaru, Harutaka ^a   Takahashi, Masaharu ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATED SUBSTRATES; CONFOCAL MICROSCOPES; CONTACT FORCES; CONTACT TIME; ENGINEERING PLASTICS; HIGH TEMPERATURE; HOT PLATES; LOW TEMPERATURES; MOLD PATTERN; NANO-IMPRINTING; NANOIMPRINTING TECHNOLOGY; RAPID THERMAL PROCESSOR; SI SUBSTRATES; SPIN-ON-GLASS; THERMAL TREATMENT; THICK LAYERS; ULTRASONIC VIBRATION;

ELASTOMERS; EXPERIMENTS; GLASS; PLASTIC COATINGS; PLASTICITY; PLASTICS MOLDING; SILICON; SPIN DYNAMICS; SPIN GLASS; TITANIUM; ULTRASONIC EFFECTS; ULTRASONIC WAVES; ULTRASONICS;

SUBSTRATES;

EID: 77955329606     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GL09     Document Type: Article

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