Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 912-915

  Ishii, Yoshiaki ^a   Taniguchi, Jun ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Binary optics element; Electron beam lithography; Inorganic resist; Nanoimprint lithography; Three dimensional nanoimprint mold

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; THREE DIMENSIONAL COMPUTER GRAPHICS; ULTRAVIOLET RADIATION;

BINARY OPTICS ELEMENTS; INORGANIC RESISTS; THREE DIMENSIONAL NANOIMPRINT MOLDS;

NANOIMPRINT LITHOGRAPHY;

ELECTRON BEAMS; LITHOGRAPHY; PRINTING; ULTRAVIOLET RADIATION;

EID: 34247609314     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.133     Document Type: Article

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