Resist shaping for replication of micro-optical elements with continuous relief in fused silica

Optics Letters

Volumn 35, Issue 8, 2010, Pages 1169-1171

  Jin, Peng ^a   Gao, Yulong ^a   Liu, Tingting ^a   Li, Xiaojun ^b   Tan, Jiubin ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

LONG SERVICE LIFE; MICRO-OPTICAL ELEMENTS; RESIST LAYERS;

DRY ETCHING; PLASMA ETCHING; SILICA;

FUSED SILICA;

EID: 77954893249     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.001169     Document Type: Article

References (12)

1. F. Nikolajeff, S. Hard, and B. Curtis, Appl. Opt. 36, 8481 (1997).
2. T. J. Suleski and K. R. Te, J. Lightwave Technol. 23, 633 (2005).
3. T. Leveder, S. Landis, L. Davoust, and N. Chaix,Micro- electron. Eng. 84, 953 (2007).
4. B. Cui and T. Veres, Microelectron. Eng. 83, 902 (2006).
5. M. T. Gale, in Micro-Optics: Elements, Systems and Applications, H. P. Herzig, ed. (Academic, 1997), pp. 162-163.
6. Z. Cui, in Nanofabrication: Principles, Capabilities and Limits, Z. Cui, ed. (Academic, 2008), pp. 166-168.
7. L. J. Heyderman, H. Schift, C. David, J. Gobrecht, and T. Schweizer, Microelectron. Eng. 54, 229 (2000).
8. H. C. Scheer and H. Schulz, Microelectron. Eng. 56,311 (2001).
9. S. Landis, N. Chaix, C. Gourgon, C. Perret, and T. Leveder, Nanotechnology 17, 2701 (2006).
10. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, J. Vac. Sci. Technol. B 14, 4129 (1996).
11. T. Borzenko, M. Tormen, G. Schmidt, L. W. Molenkamp, and H. Janssen, Appl. Phys. Lett. 79, 2246 (2001).
12. X. D. Huang, L. R. Bao, X. Cheng, L. J. Guo, S. W. Pang, and A. F. Yee, J. Vac. Sci. Technol. B 20, 2872 (2002).