Pattern replication of 100 nm to millimeter-scale features by thermal nanoimprint lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 902-905

  Cui, Bo ^a   Veres, Teodor ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Hot embossing; Liftoff; Pattern replication; Polymer viscosity; Thermal nanoimprint lithography

Indexed keywords

MOLECULAR WEIGHT; POLYMETHYL METHACRYLATES; THERMAL EFFECTS; VISCOSITY;

HOT EMBOSSING; LIFTOFF; PATTERN REPLICATION; THERMAL NANOIMPRINT LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 33646023393     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.013     Document Type: Article

References (10)

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10. g is taken as 105 °C for 12 kg/mol PMMA, while keeping other parameters the same as in Ref. [6].