Model-based scanner tuning in a manufacturing environment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Shih, C Y ^a   Peng, R C ^a   Chien, T C ^a   Guo, Y W ^a   Lee, J Y ^a   Chang, C L ^a   Huang, P C ^a   Liu, H H ^a   Lee, H J ^a   Lin, John ^a   Chang, K W ^a   Yeh, C P ^a   Shao, W J ^b   Cao, H ^b   Bruguier, A ^b   Xie, X ^b   Chang, C H ^b   Aldana, R ^b   Cao, Y ^b   Goossens, R ^b   Hsieh, Simon ^c   more..

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b Brion Technologies   (United States)

^c ASML   (Netherlands)

Author keywords

Low k1 imaging; Manufacturing environment; Model based; Scanner matching; Scanner tuning

Indexed keywords

LOW K1 IMAGING; MANUFACTURING ENVIRONMENT; MODEL-BASED; SCANNER MATCHING; SCANNER TUNING;

LITHOGRAPHY; SIMULATORS; TUNING;

SCANNING;

EID: 65849388554     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813974     Document Type: Conference Paper

References (3)

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