Model based short range mask process correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Chen, G ^a   Wang, J S ^a   Bai, S ^a   Howell, R ^a   Wiley, J ^a   Vacca, A ^a   Kurosawa, T ^b   Nishibe, T ^b   Takigawa, T ^b  

^a Brion Technologies Inc   (United States)

^b Brion Technologies KK   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER NETWORKS; ELECTRONICS INDUSTRY; ERRORS; INTEGRATED CIRCUITS; LITHOGRAPHY; MICROELECTRONICS; MICROFLUIDICS; MODEL PREDICTIVE CONTROL; PHOTOMASKS; PREDICTIVE CONTROL SYSTEMS; TECHNOLOGY;

ERROR BUDGETING; LINEARITY ERRORS; MASK ERRORS; MASK PROCESSES; MASK TECHNOLOGY; MINIMUM FEATURE SIZE (MFS); MODEL BASED (OPC); NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING; PROXIMITY EFFECTS;

ERROR CORRECTION;

EID: 45749103242     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793024     Document Type: Conference Paper

References (3)

1. Sanghee Lee et al, "New PEC optimization for the mask fabrication of sub-50nm memory device" SPIE 660725, 2007.
2. Yu Cao et al, "Optimized hardware and software for fast full-chip simulation," SPIE 5754 pp. 407, 2004.
3. Masaki Satake et al, "Evaluation of Lithography Simulation Model Accuracy for Hotspot-based Mask Quality Assurance," SPIE 66071E, 2007.