Model-based scanner tuning for process optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7520, Issue , 2009, Pages

  Chien, Tsung Chih ^a   Shih, C Y ^a   Peng, R C ^a   Liu, H H ^a   Chen, Y C ^a   Lee, H J ^a   Lin, John ^a   Chang, K W ^a   Wu, C M ^a   Hung, W H ^a   Lee, Tommy ^a   Wu, H C ^a   Xie, X ^b   Shao, W J ^b   Chang, C H ^b   Aldana, R ^b   Cao, Y ^b   Goossens, R J G ^b   Hsieh, Simon ^c  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b Brion Technologies Inc   (United States)

^c ASML   (Netherlands)

Author keywords

Low k1 imaging; Manufacturing environment; Model based; Reticle specific optimization; Scanner tuning

Indexed keywords

ADVANCED TECHNOLOGY; CALIBRATED MODEL; CD MEASUREMENTS; DEFECT REDUCTION; IMAGING EFFECTS; LITHOGRAPHY PROCESS; LOW K1 IMAGING; MANUFACTURING ENVIRONMENT; MANUFACTURING ENVIRONMENTS; MODEL CONSTRUCTION; MODEL SIMULATION; MODEL-BASED; MULTIPLE USE; ON-WAFER; OPTIMAL PRINTING; PROCESS LATITUDES; PROCESS OPTIMIZATION; USE-MODEL; YIELD IMPROVEMENT;

COMPUTER SIMULATION; LITHOGRAPHY; OPTICAL INSTRUMENTS; OPTIMIZATION; TUNING;

SCANNING;

EID: 77952060646     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.842551     Document Type: Conference Paper

References (4)

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3. Shih, C. Y.; Peng, R. C.; Chien, T. C.; Guo, Y. W.; Lee, J. Y.; Chang, C. L.; Huang, P. C.; Liu, H. H.; Lee, H. J.; Lin, John; Chang, K. W.; Yeh, C. P.; Shao, W. J.; Cao, H.; Bruguier, A.; Xie, X.; Chang, C. H.; Aldana, R.; Cao, Y.; Goossens, R.; Hsieh, Simon, "Model-based scanner tuning in a manufacturing environment," Proc. SPIE, Vol.7274, 72740T (2009)
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