Mask-LMC: Lithographic simulation and defect detection from high resolution mask images

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Chen, George ^a   Wiley, James N ^a   Wang, Jen Shiang ^a   Howell, Rafael C ^a   Bai, Shufeng ^a   Chen, Yi Fan ^a   Chen, Frank ^a   Cao, Yu ^a   Takigawa, Tadahiro ^b   Kurosawa, Terunobu ^b   Tsuchiya, Hideo ^c   Usuda, Kinya ^c   Tokita, Masakazu ^c   Ozaki, Fumio ^d   Kikuiri, Nobutaka ^d   Tsuji, Yoshitake ^d  

^a Brion Technologies Inc   (United States)

^b Brion Technologies KK   (Japan)

^c NUFLARE TECHNOLOGY INC   (Japan)

^d Advanced Mask Inspection Technology Inc   (Japan)

Author keywords

193nm; AIMS ; ; Deconvolution; High resolution; Inspection; Litho simulation; LMC; Mask; Reticle; Wafer printability

Indexed keywords

193NM; HIGH RESOLUTION; LITHO SIMULATION; LMC; RETICLE; WAFER PRINTABILITY;

CONVOLUTION; DEFECTS; DETECTORS; DIES; LITHOGRAPHY; OPTICAL INSTRUMENTS; SECURITY OF DATA; SIMULATORS;

INSPECTION;

EID: 69949147520     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824288     Document Type: Conference Paper

References (7)

1. Y. Huang, E. Tseng, B. S.-M. Lin, C. C. Yu, C.-M. Wang, H.-Y. Liu, "Full-chip lithography manufacturability check for yield improvement", Proc. SPIE 6156, (2006).
2. TM, a trademark of Carl Zeiss.
3. N. Kikuiri, etc, "Development of Advanced Reticle Inspection Apparatus for hp 65nm node device and beyond", Proc. SPIE Vol. 6283, (2006).
4. C. Hess, etc. "Wafer Plane Inspection with Soft Resist Thresholding", Proc. of SPIE Vol. 7122, (2008).
5. R. Nagpal, F. Ghadiali, F. Ghadiali, J. Kim, T. Huang, S. Pang, "Wafer plane inspection for advanced reticle defects, " Proc. SPIE Vol. 7028, (2008).
6. E. Gallagher, K. Badger, M. Lawliss, Y. Kodera, J. T. Azpiroz, S. Pang, H. Zhang, E. Eugenieva, C. Clifford, A. Goonesekera, Y. Tian, "Wafer Plane Inspection Evaluated for PhotoMask Production", Proc. of SPIE Vol. 7122, (2008).
7. S. Hunsche, Q. Zhao, X. Xie, R. Socha, H.-Y. Liu, P. Nikolsky, A. Ngai, P. van Adrichem, M. Crouse, I. Lalovic, "Improved model predictability by machine data in computational lithography and application to laser bandwidth tuning", Proc. SPIE, Vol.7274, 727405 (2009).