Printability verification function of mask inspection system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Tsuchiya, Hideo ^a,c   Yamabe, Masaki ^b   Tokita, Masakazu ^a   Takahara, Kenichi ^a   Usuda, Kinya ^c,d   Ozaki, Fumio ^d   Kikuiri, Nobutaka ^d  

^a Mask Inspection Equipment Technology Research Laboratory   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^c NUFLARE TECHNOLOGY INC   (Japan)

^d Advanced Mask Inspection Technology Inc   (Japan)

Author keywords

Aerial image; Lithography; Mask inspection system; NPI 6000; Printability; Pseudo defects; Resist image; Simulation

Indexed keywords

AERIAL IMAGES; MASK INSPECTION SYSTEM; NPI-6000; PRINTABILITY; PSEUDO DEFECTS; RESIST IMAGE; SIMULATION;

DEFECTS; INSPECTION EQUIPMENT; PHOTOMASKS;

INSPECTION;

EID: 77954415745     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.829739     Document Type: Conference Paper

References (5)

1. George Chen, etc, "Mask-LMC: Lithographic Simulation and Defect Detection from High Resolution Mask Images", Proc. SPIE Vol. 7379, (2009).
2. Masakazu Tokita, etc, "A study of mask inspection method with pattern priority and printability check", Proc. SPIE Vol. 7379, (2009).
3. C.Y. Chena, etc, "Mask Defect Auto Disposition based on Aerial Image in Mask Production", Proc. SPIE Vol. 7379, 73791F (2009).
4. Hideo Tsuchiya, etc, "Die-to-database mask inspection with variable sensitivity", Proc. SPIE Vol. 7028, 70282I (2008).
5. SEMI Standards P41-0304: Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools.