TEM study of locally coated nanopore fabricated by ion-beam-induced deposition in a thin membrane

Micron

Volumn 41, Issue 6, 2010, Pages 609-614

  Wu, Meng Yue ^a   Chen, Ping ^a   Ziese, Ulrike ^a   Alkemade, Paul F A ^a   Salemink, Huub W M ^a   Zandbergen, Henny W ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

EDX; EELS; FIB; IBID; Membrane; Nanopore; Silicon nitride; Silicon oxide

Indexed keywords

CARBON LAYERS; CHEMICAL COMPOSITIONS; CHEMICAL DISTRIBUTIONS; EDX; EELS; FIB; IBID; INNER SURFACES; ION BEAM INDUCED DEPOSITION; ION-BEAM MILLING; MATERIAL DEPOSITION; PORE SHRINKAGE; PRECURSOR GAS; PT PARTICLE; SILICON NITRIDE MEMBRANE; TEM; THIN MEMBRANE; THREE-DIMENSIONAL ELECTRONS;

ELECTRIC IMPEDANCE TOMOGRAPHY; ELECTRON ENERGY LOSS SPECTROSCOPY; ION BEAMS; IONS; NANOPORES; PLATINUM; SHRINKAGE; SILICON NITRIDE; SUPERCONDUCTING MATERIALS; THREE DIMENSIONAL; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; MEMBRANES; SILICON OXIDES;

SILICON OXIDES; NANOPORES;

TETRA;

EID: 77954387388     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micron.2010.03.009     Document Type: Article

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