Preparation of rutile and anatase phases titanium oxide film by RF sputtering

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 5, 2008, Pages 2659-2664

  Huang, Hong Hsin ^a   Huang, Chia Chen ^a   Huang, Ping Chih ^b   Yang, Cheng Fu ^c   Hsu, Ching Yun ^b  

^a CHENG SHIU UNIVERSITY   (Taiwan)

^b Department of Chemical and Materials Engineering ^*  (Taiwan)

^c NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

Author keywords

Energy gap; Ratio of anatase and rutile phases; RF sputter; TiO 2 films

Indexed keywords

CRYSTALLINE STRUCTURES; DEPOSITION TEMPERATURE (TD); GLASS SUBSTRATES; R F SPUTTERING; RF MAGNETRON SPUTTERING; RF POWERING; RUTILE AND ANATASE; RUTILE PHASE; TITANIUM OXIDE FILMS; UV-VIS SPECTROMETERS; X RAY DIFFRACTION (XRD);

FILM PREPARATION; MAGNETRON SPUTTERING; OXIDE FILMS; OXIDE MINERALS; SPUTTER DEPOSITION; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

TITANIUM OXIDES;

EID: 45849107648     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.548     Document Type: Conference Paper

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