Growth behavior and microstructure of arc ion plated titanium dioxide

Surface and Coatings Technology

Volumn 204, Issue 6-7, 2009, Pages 915-922

  Chung, Chi Jen ^a   Lin, Hsin I ^b   Hsieh, Ping Yen ^b   Chen, Keh Chang ^b   He, Ju Liang ^b   Leyland, Adrian ^c   Matthews, Allan ^c  

^a CENTRAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b FENG CHIA UNIVERSITY   (Taiwan)

^c UNIVERSITY OF SHEFFIELD   (United Kingdom)

Author keywords

Anatase; Arc ion plating (AIP); Optical emission spectroscopy (OES); Rutile; Titanium dioxide

Indexed keywords

AMORPHOUS STRUCTURES; ANATASE; ANATASE PHASE; ARC ION PLATING; ARC ION PLATING (AIP); CATHODE SURFACE; DEPOSITION PROCESS; DEPOSITION TIME; GROWTH BEHAVIOR; INITIAL STAGES; MICRO-STRUCTURAL CHARACTERIZATION; OXYGEN PARTIAL PRESSURE; RUTILE GROWTH; RUTILE PHASE; TEM; TIO; TITANIUM ATOMS; XRD;

ACTIVATION ENERGY; CAVITY RESONATORS; CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; ION IMPLANTATION; LIGHT EMISSION; MICROSTRUCTURE; OPTICAL EMISSION SPECTROSCOPY; OXIDE MINERALS; OXYGEN SUPPLY; PARTIAL PRESSURE; PHOTOCATALYSIS; PHOTORESISTS; PHYSICAL VAPOR DEPOSITION; POSITIVE IONS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TITANIUM PLATING; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS FILMS;

EID: 71849114497     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.06.030     Document Type: Article

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