The photocatalytic property of TiO2 films deposited at low temperature

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Han, Yeonghun ^a   Jung, Seungjae ^a   Lee, Jungjoong ^a  

^a Seoul National University   (South Korea)

Author keywords

Anatase; Films; Inductively coupled; Photocatalytic; Photocurrent; Reactive sputtering; TiO2

Indexed keywords

ANATASE; ANATASE PHASE; DECOMPOSITION RATE; HIGH CRYSTALLINITY; INDUCTIVELY COUPLED; LOW PROCESS TEMPERATURE; LOW TEMPERATURES; METHYLENE BLUE; PHOTOCATALYTIC; PHOTOCATALYTIC PROPERTY; POLYCRYSTALLINE; REACTIVE MAGNETRON SPUTTERING; RUTHERFORD BACK-SCATTERING SPECTROMETRY; TIO; TIO2;

AUGER ELECTRON SPECTROSCOPY; HEATING; INDUCTIVELY COUPLED PLASMA; OPEN CIRCUIT VOLTAGE; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION;

PHOTOCURRENTS;

EID: 70349421020     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730905     Document Type: Conference Paper

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