Effect of Al content on the microstructure and mechanical properties of Mo-Al-Si-N films synthesized by DC magnetron sputtering

Surface and Coatings Technology

Volumn 204, Issue 21-22, 2010, Pages 3371-3375

  Yuan, Z G ^a   Yang, J F ^a   Wang, X P ^a   Fang, Q F ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

Hardness; Magnetron sputtering; Microstructure; Molybdenum nitride; Oxidation resistance

Indexed keywords

AL CONTENT; CHEMICAL COMPOSITIONS; COMPOSITE TARGET; DC MAGNETRON SPUTTERING; ENERGY DISPERSIVE SPECTROMETERS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HARDNESS AND ELASTIC MODULUS; MAXIMUM VALUES; MICROSTRUCTURE AND MECHANICAL PROPERTIES; MOLYBDENUM NITRIDE; OXIDATION TEMPERATURE; PREFERRED ORIENTATIONS; REACTIVE MAGNETRON SPUTTERING; SI CONTENT; SI WAFER; SIN FILMS;

COMPOSITE FILMS; FIELD EMISSION; FIELD EMISSION MICROSCOPES; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; METALLIC FILMS; MICROSTRUCTURE; MOLYBDENUM; NANOINDENTATION; NITRIDES; OXIDATION; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; STAINLESS STEEL; THERMOGRAVIMETRIC ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM;

EID: 77953693533     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.03.054     Document Type: Article

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