Characterization of Mo-Al-N nanocrystalline films synthesized by reactive magnetron sputtering

Materials Research Bulletin

Volumn 44, Issue 1, 2009, Pages 86-90

  Yang, J F ^a   Yuan, Z G ^a   Liu, Q ^b   Wang, X P ^a   Fang, Q F ^a,b  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

^b NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

Author keywords

A. Nitrides; B. Sputtering; C. Electron microscopy; D. Mechanical properties

Indexed keywords

ALUMINA; CHEMICAL OXYGEN DEMAND; CONCENTRATION (PROCESS); HARDNESS; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; METALLIC FILMS; MICROSCOPIC EXAMINATION; MOLYBDENUM; NANOCRYSTALLINE ALLOYS; NITRIDES; ORGANIC POLYMERS; OXIDATION; OXIDATION RESISTANCE;

A. NITRIDES; ADDITION OF AL; AL CONCENTRATIONS; AL CONTENTS; ALUMINUM CONTENTS; B. SPUTTERING; C. ELECTRON MICROSCOPY; D. MECHANICAL PROPERTIES; DC REACTIVE MAGNETRON SPUTTERING; GRAIN SIZES; N FILMS; NANOCRYSTALLINE FILMS; REACTIVE MAGNETRON SPUTTERING; RESISTANCE TEMPERATURES; SUBSTRATE TEMPERATURES;

ALUMINUM;

EID: 56249096539     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2008.03.029     Document Type: Article

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