Line-edge roughness and the ultimate limits of lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Mack, Chris A ^a  

^a NONE

Author keywords

autocorrelation; correlation length; Line edge roughness; linewidth roughness; roughness exponent; stochastic modeling

Indexed keywords

CORRELATION LENGTHS; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; ROUGHNESS EXPONENT; STOCHASTIC MODELING;

AMPLIFICATION; AUTOCORRELATION; PHOTORESISTS; SOIL STRUCTURE INTERACTIONS; STOCHASTIC SYSTEMS;

REGRESSION ANALYSIS;

EID: 77953514004     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848236     Document Type: Conference Paper

References (19)

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