Multidimensional simulation and optimization of hybrid laser and discharge plasma devices for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Hassanein, A ^a   Sizyuk, V ^a   Sizyuk, T ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

Collection mirrors; Debris mitigation; DPP; EUV devices; Gaseous jets; Heights; LPP; MHD

Indexed keywords

DEBRIS MITIGATION; DPP; EUV DEVICES; GASEOUS JETS; HEIGHTS; LPP;

DEBRIS; EXTREME ULTRAVIOLET LITHOGRAPHY; INDUSTRIAL APPLICATIONS; LITHOGRAPHY; LUMINANCE; MAGNETIC FIELDS; MAGNETIC MIRRORS; MIRRORS; OPTIMIZATION; REFLECTION; THREE DIMENSIONAL COMPUTER GRAPHICS; TIN;

EQUIPMENT;

EID: 77953367541     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771218     Document Type: Conference Paper

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