Optimization of EUV laser and discharge devices for high-volume manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Hassanein, A ^a   Sizyuk, V ^a   Sizyuk, T ^a   Morozov, V ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Computer simulation; Discharge produced plasma; EUV radiation; HEIGHTS; Laser produced plasma; MHD; Monte Carlo method

Indexed keywords

CHARGED PARTICLES; COMPUTER SIMULATION; ELECTRODES; MAGNETOHYDRODYNAMICS; MONTE CARLO METHODS; PLASMA INTERACTIONS;

DISCHARGE PRODUCED PLASMA; EUV RADIATION; LASER PRODUCED PLASMA;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148896807     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712300     Document Type: Conference Paper

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