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Applied Physics Letters

Volumn 87, Issue 17, 2005, Pages 1-3

Work function tuning of nickel silicide by co-sputtering nickel and silicon

(3) Biswas, Nivedita a Gurganus, Jason a Misra, Veena a

a North Carolina State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATE DIELECTRICS; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NICKEL SILICIDE;

AUGER ELECTRON SPECTROSCOPY; GATES (TRANSISTOR); LASER TUNING; MAGNETRON SPUTTERING; PERMITTIVITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 28344449012 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2115072 Document Type: Article

Times cited : (28)

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