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Volumn 57, Issue 6, 2010, Pages 1362-1368

Performance comparison of silicon steep subthreshold FETs

Author keywords

Feedback FET (FBFET); Impact ionization MOSFET (IMOS); Nanoelectromechanical FET (NEMFET); Tunnel FET (TFET)

Indexed keywords

MOS-FET; MOSFET SCALING; NANO-ELECTROMECHANICAL; NOVEL DEVICES; OFF-STATE CURRENT; PERFORMANCE COMPARISON; STANDBY-POWER DISSIPATION; SUBTHRESHOLD; SUBTHRESHOLD SWING; TUNNEL FET;

EID: 77952741987     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2010.2047066     Document Type: Article
Times cited : (58)

References (21)
  • 1
    • 17644379098 scopus 로고    scopus 로고
    • Vertical tunnel field-effect transistor with bandgap modulation and workfunction engineering
    • K. K. Bhuwalka, J. Schulze, and I. Eisele, "Vertical tunnel field-effect transistor with bandgap modulation and workfunction engineering," in Proc. 34th ESSDERC, 2004, pp. 241-244.
    • (2004) Proc. 34th ESSDERC , pp. 241-244
    • Bhuwalka, K.K.1    Schulze, J.2    Eisele, I.3
  • 2
    • 34447321846 scopus 로고    scopus 로고
    • Double-gate tunnel FET with high-k gate dielectric
    • Jul.
    • K. Boucart and A. M. Ionescu, "Double-gate tunnel FET with high-k gate dielectric," IEEE Trans. Electron Devices, vol.54, no.7, pp. 1725-1733, Jul. 2007.
    • (2007) IEEE Trans. Electron Devices , vol.54 , Issue.7 , pp. 1725-1733
    • Boucart, K.1    Ionescu, A.M.2
  • 3
    • 64549108830 scopus 로고    scopus 로고
    • Doublegate strained-Ge heterostructure tunneling FET (TFET) with record high drive currents and-60 mV/dec subthreshold slope
    • T. Krishnamohan, D. Kim, S. Raghunathan, and K. Saraswat, "Doublegate strained-Ge heterostructure tunneling FET (TFET) with record high drive currents and-60 mV/dec subthreshold slope," in IEDM Tech. Dig., 2008, pp. 1-3.
    • (2008) IEDM Tech. Dig , pp. 1-3
    • Krishnamohan, T.1    Kim, D.2    Raghunathan, S.3    Saraswat, K.4
  • 4
    • 69749099372 scopus 로고    scopus 로고
    • Effective capacitance and drive current for tunnel FET (TFET) CV/I estimation
    • Sep.
    • S. Mookerjea, R. Krishnan, S. Datta, and V. Narayanan, "Effective capacitance and drive current for tunnel FET (TFET) CV/I estimation," IEEE Trans. Electron Devices, vol.56, no.9, pp. 2092-2098, Sep. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.9 , pp. 2092-2098
    • Mookerjea, S.1    Krishnan, R.2    Datta, S.3    Narayanan, V.4
  • 6
    • 41949092207 scopus 로고    scopus 로고
    • The tunnel source (PNPN) n-MOSFET: A novel high performance transistor
    • Apr.
    • V. Nagavarapu, R. Jhaveri, and J. C. S. Woo, "The tunnel source (PNPN) n-MOSFET: A novel high performance transistor," IEEE Trans. Electron Devices, vol.55, no.4, pp. 1013-1019, Apr. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.4 , pp. 1013-1019
    • Nagavarapu, V.1    Jhaveri, R.2    Woo, J.C.S.3
  • 7
    • 12344320429 scopus 로고    scopus 로고
    • Impact ionization MOS (I-MOS)-Part I: Device and circuit simulations
    • Jan.
    • K. Gopalakrishnan, P. B. Griffin, and J. D. Plummer, "Impact ionization MOS (I-MOS)-Part I: Device and circuit simulations," IEEE Trans. Electron Devices, vol.52, no.1, pp. 69-76, Jan. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.1 , pp. 69-76
    • Gopalakrishnan, K.1    Griffin, P.B.2    Plummer, J.D.3
  • 9
    • 33746589939 scopus 로고    scopus 로고
    • Static and dynamic TCAD analysis of IMOS performance: From single device to the circuit
    • Aug.
    • F. Mayer, C. Le Royer, G. Le Carval, L. Clavelier, and S. Deleonibus, "Static and dynamic TCAD analysis of IMOS performance: From single device to the circuit," IEEE Trans. Electron Devices, vol.53, no.8, pp. 1852-1857, Aug. 2006.
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.8 , pp. 1852-1857
    • Mayer, F.1    Le Royer, C.2    Le Carval, G.3    Clavelier, L.4    Deleonibus, S.5
  • 13
    • 78650760310 scopus 로고    scopus 로고
    • Feedback FET: A novel transistor exhibiting steep switching behavior at low bias voltages
    • A. Padilla, C. W. Yeung, C. Shin, C. Hu, and T. J. King Liu, "Feedback FET: A novel transistor exhibiting steep switching behavior at low bias voltages," in IEDM Tech. Dig., 2008, pp. 1-4.
    • (2008) IEDM Tech. Dig , pp. 1-4
    • Padilla, A.1    Yeung, C.W.2    Shin, C.3    Hu, C.4    King Liu, T.J.5
  • 14
    • 71049141790 scopus 로고    scopus 로고
    • Programming characteristics of the steep turn-on/off feedback FET (FBFET)
    • C. W. Yeung, A. Padilla, T. J. King Liu, and C. Hu, "Programming characteristics of the steep turn-on/off feedback FET (FBFET)," in VLSI Symp. Tech. Dig., 2009, pp. 176-177.
    • (2009) VLSI Symp. Tech. Dig , pp. 176-177
    • Yeung, C.W.1    Padilla, A.2    King Liu, T.J.3    Hu, C.4
  • 15
    • 33847746657 scopus 로고    scopus 로고
    • A new nano-electromechanical field effect transistor (NEMFET) design for low-power electronics
    • H. Kam, D. T. Lee, R. T. Howe, and T. J. King, "A new nano-electromechanical field effect transistor (NEMFET) design for low-power electronics," in IEDM Tech. Dig., 2005, pp. 463-466.
    • (2005) IEDM Tech. Dig , pp. 463-466
    • Kam, H.1    Lee, D.T.2    Howe, R.T.3    King, T.J.4
  • 17
    • 77952745564 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors 2007
    • International Technology Roadmap for Semiconductors 2007 Edition, ITRS, 2007.
    • (2007) Edition, ITRS
  • 18
    • 77952742714 scopus 로고
    • ISE TCAD release 10.0
    • Zurich, Switzerland
    • ISE TCAD Release 10.0, Integr. Syst. Eng., Zurich, Switzerland, 1995-2004.
    • (1995) Integr. Syst. Eng.
  • 19
    • 0034273929 scopus 로고    scopus 로고
    • Current-voltage characteristics of high current density silicon Esaki diodes grown by molecular beam epitaxy and the influence of thermal annealing
    • Sep.
    • M. W. Dashiell, R. T. Troeger, S. L. Rommel, T. N. Adam, P. R. Berger, C. Guedj, J. Kolodzey, A. C. Seabaugh, and R. Lake, "Current-voltage characteristics of high current density silicon Esaki diodes grown by molecular beam epitaxy and the influence of thermal annealing," IEEE Trans. Electron Devices, vol.47, no.9, pp. 1707-1714, Sep. 2000.
    • (2000) IEEE Trans. Electron Devices , vol.47 , Issue.9 , pp. 1707-1714
    • Dashiell, M.W.1    Troeger, R.T.2    Rommel, S.L.3    Adam, T.N.4    Berger, P.R.5    Guedj, C.6    Kolodzey, J.7    Seabaugh, A.C.8    Lake, R.9


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.