Numerical simulations for a quantitative analysis of AFM electrostatic nanopatterning on PMMA by Kelvin force microscopy

Nanotechnology

Volumn 21, Issue 22, 2010, Pages

  Palleau, E ^a   Ressier, L ^a   Borowik, L ^b   Melin T ^b  

^a INSA   (France)

^b INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; CAPACITANCE EFFECT; DIRECTED ASSEMBLY; ELECTROSTATIC TRAP; HIGH RESOLUTION; KELVIN FORCE MICROSCOPY; NANO-OBJECTS; NANOPATTERNING; NUMERICAL SIMULATION; QUANTITATIVE ANALYSIS; SCANNING PROBES;

CHARGED PARTICLES; COMPUTER SIMULATION; ELECTRIC FIELDS; ELECTROSTATIC FORCE; PHOTORESISTS; THIN FILMS;

ATOMIC FORCE MICROSCOPY;

EID: 77952416387     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/22/225706     Document Type: Article

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