Local surface charges direct the deposition of carbon nanotubes and fullerenes into nanoscale patterns

Nano Letters

Volumn 7, Issue 10, 2007, Pages 3007-3012

  Seemann, Livia ^a   Stemmer, Andreas ^a   Naujoks, Nicola ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELDS; FULLERENES; SURFACE ACTIVE AGENTS; SURFACE CHARGE;

COULOMB ATTRACTION GUIDES; NANOSCALE PATTERNS; SOLID SURFACES;

CARBON NANOTUBES;

CARBON NANOTUBE; FULLERENE DERIVATIVE; SURFACTANT;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRICITY; ELECTROPLATING INDUSTRY; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTROPLATING; ELECTROSTATICS; FULLERENES; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOTECHNOLOGY; NANOTUBES, CARBON; PARTICLE SIZE; SURFACE PROPERTIES; SURFACE-ACTIVE AGENTS;

EID: 36249006154     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0713373     Document Type: Article

References (31)

1. Bachtold, A.; Hadley, P.; Nakanishi, T.; Dekker, C. Science 2001, 294, 1317.
2. Yuzvinsky, T. D.; Fennimore, A. M.; Kis, A.; Zettl, A. Nanotechnology 2006, 17, 434.
3. Rueckes, T.; Kim, K.; Joselevich, E.; Tseng, G. Y.; Cheung, C.; Lieber, C. M. Science 2000, 289, 94.
4. Kong, J.; Franklin, N. R.; Zhou, C.; Chapline, M. G.; Peng, S.; Cho, K.; Dai, H. Science 2000, 287, 622.
5. Stampfer, C.; Helbling, T.; Obergfell, D.; Schöberle, B.; Tripp, M. K.; Jungen, A.; Roth, S.; Bright, V. M.; Hierold, C. Nano Lett. 2006, 6, 233.
6. Fan, S.; Chapline, M. G.; Franklin, N. R.; Tombler, T. W.; Cassell, A. M.; Dai, H. Science 1999, 283, 512.
7. Yamamoto, K.; Akita, S.; Nakayama, Y. J. Phys. D: Appl. Phys. 1998, 31, L34.
8. Krupke, R.; Hennrich, F.; von Löhneysen, H.; Kappes, M. M. Science 2003, 301, 344.
9. Xin, H.; Woolley, A. T. Nano Lett. 2004, 4, 1481.
10. Im, J.; Lee, M.; Myung, S.; Huang, L.; Rao, S. G.; Lee, D. J.; Koh, J.; Hong, S. Nanotechnology 2006, 17, 3569.
11. Wang, L.; Liu, B.; Liu, D.; Yao, M.; Hou, Y.; Yu, S.; Cui, T.; Li, D.; Zou, G.; Iwasiewicz, A.; Sundqvist, B. Adv. Mater. 2006, 18, 1883.
12. Backer, S. A.; Suez, I.; Fresco, Z. M.; Ronaldi, M.; Fréchet, J. M. J. Langmuir 2007, 23, 2297.
13. Barry, C. R.; Gu, J.; Jacobs, H. O. Nano Lett. 2005, 5, 2078.
14. Jacobs, H. O.; Whitesides, G. M. Science 2001, 291, 1763.
15. Mesquida, P.; Stemmer, A. Adv. Mater. 2001, 13, 1395.
16. Mesquida, P.; Stemmer, A. Microelectron. Eng. 2002, 61, 671.
17. Naujoks, N.; Stemmer, A. J. Nanosci. Nanotechnol. 2006, 6, 2445.
18. Mesquida, P.; Ammann, D. L.; MacPhee, C. E.; McKendry, R. A. Adv. Mater. 2005, 17, 893.
19. Cao, T.; Xu, Q.; Winkleman, A.; Whitesides, G. M. Small 2005, 1, 1191.
20. Seemann, L.; Stemmer, A.; Naujoks, N. Microelectron. Eng. 2007, 84, 1423.
21. Sessler, G. M. Electrets; Springer, Berlin, 1987.
22. Jacobs, H. O.; Knapp, H. F.; Muller, S.; Stemmer, A. Ultramicroscopy 1997, 69, 39.
23. Nonnenmacher, M.; O'Boyle, M. P.; Wickramasinghe, H. K. Appl. Phys. Lett. 1991, 58, 2921.
24. Islam, M. F.; Rojas, E.; Bergey, D. M.; Johnson, A. T.; Yodh, A. G. Nano Lett. 2003, 2, 269.
25. Cowie, J. M. G.; Cree, S. H. Annu. Rev. Phys. Chem. 2003, 40, 85.
26. Sui, X.; Shao, C.; Liu, Y. Polymer 2007, 48, 1459.
27. Fa, K.; Paruchuri, V. K.; Brown, S. C.; Moudgil, B. M.; Miller, J. D. Phys. Chem. Chem. Phys. 2005, 7, 678.
28. Beattie, J. K. Lab Chip 2006, 6, 1409.
29. Beeby, A.; Eastoe, J.; Heenan, R. K. J. Chem. Soc., Chem. Commun. 1994, 10, 173.
30. Zou, S.; Maspoch, D.; Wang, Y.; Mirkin, C. A.; Schatz, G. C. Nano Lett. 2007, 7, 276.
31. Hennrich, F.; Krupke, R.; Arnold, K.; Rojas Stütz, J. A.; Lebedkin, S.; Koch, T.; Schimmel, T.; Kappes, M. M. J. Phys. Chem. 2007, 111, 1932.