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Volumn 107, Issue 8, 2010, Pages

Impact of in situ oxygen plasma cleaning on the resistance of Ru and Au-Ru based rf microelectromechanical system contacts in vacuum

(6) Walker, M a Nordquist, C b Czaplewski, D b Patrizi, G b McGruer, N c Krim, J d

a North Carolina State University (United States)

b SANDIA NATIONAL LABORATORIES (United States)

c Northeastern University (United States)

d NORTH CAROLINA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE VALUES; CONTACT SURFACE; CREEP PROPERTIES; EXPERIMENTAL ERRORS; IN-SITU; IN-VACUUM; ORDERS OF MAGNITUDE; OXIDE LAYER; OXYGEN PLASMA EXPOSURE; OXYGEN PLASMAS; PLASMA EXPOSURE; POSTDEPOSITION OXIDATION; POWER LAW; RADIO FREQUENCY MICROELECTROMECHANICAL SYSTEMS; RESISTANCE VALUES; RF MICROELECTROMECHANICAL SYSTEMS; SPUTTERING TECHNIQUES; SURFACE SCIENCE; THEORETICAL VALUES; TIME DEPENDENCE; TIME-DEPENDENT; ULTRAHIGH VACUUM SYSTEM;

APPROXIMATION THEORY; COMPOSITE MICROMECHANICS; CREEP; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; OXYGEN; PLASMAS; RUTHENIUM ALLOYS; RUTHENIUM COMPOUNDS; VACUUM;

IMPACT RESISTANCE;

EID: 77952407468 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3353991 Document Type: Article

Times cited : (39)

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