Cryogenic performance of RF MEMS switch contacts

Journal of Microelectromechanical Systems

Volumn 17, Issue 6, 2008, Pages 1460-1467

  Brown, Chris ^a   Morris III, Arthur S ^b   Kingon, Angus I ^c   Krim, Jacqueline ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b Wispry Inc   (United States)

^c Brown University   (United States)

Author keywords

Contact resistance; Electrical contacts; Microelectromechanical systems (MEMS); RF MEMS; Switches

Indexed keywords

COMPOSITE MICROMECHANICS; CONTACT RESISTANCE; CRYOGENICS; ELECTROMECHANICAL DEVICES; HELIUM; INERT GASES; MECHATRONICS; MEMS; MICROMECHANICS; SWITCHES;

ADSORBED FILMS; ASPERITY CONTACTS; CONSTRICTION RESISTANCES; CONTACT RESISTANCE VALUES; CONTACT SURFACES; CONTACT VOLTAGES; CRYOGENIC TEMPERATURES; ELECTRICAL CONTACTS; ENVIRONMENTAL CONDITIONS; HEATING MODELS; LOW PRESSURES; MICROELECTROMECHANICAL SYSTEMS (MEMS); NITROGEN ENVIRONMENTS; ORDERS OF MAGNITUDES; RF MEMS; RF MICROELECTROMECHANICAL SYSTEM SWITCHES; STICTION FAILURES; SURFACE FILMS;

MICROELECTROMECHANICAL DEVICES;

EID: 57449110516     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2008.2005328     Document Type: Article

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