Inverse lithography as a DFM tool: Accelerating design rule development with model-based assist feature placement, fast optical proximity correction and lithographic hotspot detection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6925, Issue , 2008, Pages

  Prins, Steve ^a   Blatchford, James ^a   Chang, Simon ^a   Flanagin, Lewis ^a   Jessen, Scott ^a   O'Brien, Sean ^a   Xiao, Guangming ^b   Lin, Timothy ^b   Dam, Thuc ^b   Gleason, Bob ^b  

^a TEXAS INSTRUMENTS   (United States)

^b Luminescent Technologies Inc   (United States)

Author keywords

Contact holes; Design rule; Lithography simulation; OPC

Indexed keywords

CONTACT HOLES; DESIGN RULES; LITHOGRAPHIC HOTSPOT DETECTION; LITHOGRAPHY SIMULATION;

COMPUTER SIMULATION; GEOMETRY; LIGHTING; OPTIMIZATION; PATTERN MATCHING;

LITHOGRAPHY;

EID: 43249116426     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.774581     Document Type: Conference Paper

References (4)