Pushing the lithography limit - Applying Inverse Lithography Technology (ILT) at the 65nm generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Hung, Chi Yuan ^a   Zhang, Bin ^a   Guo, Eric ^a   Pang, Linyong ^b   Liu, Yong ^b   Wang, Kechang ^b   Dai, Grace ^b  

^a QSI (Quantum Semiconductor International) Co   (South Korea)

^b Luminescent Technologies Inc   (United States)

Author keywords

65nm Technology; Inverse Lithography Technology (ILT); Lithography; OPC; RET; SRAM

Indexed keywords

CONSTRAINT THEORY; MASKS; OPTIMIZATION; STATIC RANDOM ACCESS STORAGE; WSI CIRCUITS;

65NM TECHNOLOGY; INVERSE LITHOGRAPHY TECHNOLOGY; OPTICAL PROXIMITY CORRECTION (OPC); RET;

LITHOGRAPHY;

EID: 33745764581     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655728     Document Type: Conference Paper

References (11)

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